800°C Plasma Enhanced Atomic Layer Deposition (PEALD) System W/ 4" Rotary Stage - ALD-800X-4-PE

800°C Plasma Enhanced Atomic Layer Deposition (PEALD) System W/ 4" Rotary Stage - ALD-800X-4-PE

RM0.00 MYR
RM0.00 MYR
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800°C Plasma Enhanced Atomic Layer Deposition (PEALD) System W/ 4" Rotary Stage - ALD-800X-4-PE
  • 800°C Plasma Enhanced Atomic Layer Deposition (PEALD) System W/ 4" Rotary Stage - ALD-800X-4-PE
  • 800°C Plasma Enhanced Atomic Layer Deposition (PEALD) System W/ 4" Rotary Stage - ALD-800X-4-PE
800°C Plasma Enhanced Atomic Layer Deposition (PEALD) System W/ 4" Rotary Stage - ALD-800X-4-PE

800°C Plasma Enhanced Atomic Layer Deposition (PEALD) System W/ 4" Rotary Stage - ALD-800X-4-PE

SKU: ald800x4pe

Price: RFQ

Description

 ALD-800X-4-PE is a compact plasma-enhanced atomic layer deposition (PE-ALD) system with five high-frequency valves, 4" shower head, and rotary heatable sample stage, and a 300 W RF generator. The PE-ALD processes can be realized by the screen panel control system and laptop software control system. This PE-ALD has several advantages, such as a wide range of precursor selection and operation temperature windows (especially good for heat-sensitive material at low temperatures), uniform coating with rotary stage, and low cost. SPECIFICATIONS: Power 208 - 240VAC, single phase, 50/60 Hz 9.5 kW total (required for all heating parts and plasma to work properly) Control Panel All processing parameters of ALD are controlled by PLC via a 6" touch screen panel, including vapor pulse time, inert gas flow rate, temperature for heating bubbler and belt, and rotation speed of sample stage 13.56MHZ, 100W max. RF plasma power and auto-matching High-frequency ALD valves were used to control pulse duration interval with micro-second precision Control two channels of gas delivery with ±0.2%F.S via MFC Adjust vacuum pressure by controlling the gas flow rate Other parameters upon request of the customer Please click the picture left to see the control interface ALD valve One frequency ALD valve Max. frequency on/off: 283 HZ Min. Pulse time: 10 ms Can deliver drying gas or liquid-vapor Shower Head Material: Aluminium or Stainless steel 4" shower head with 0.5 mm holes 1/4" dia. tube for gas or vapor inlet which connects to ALD valve Special design for uniform distribution of gas or vaper Sample Stage 4" diameter rotary and heatable sample stage Speed: 0 - 5 RPM adjustable via the control panel Temperature: Although the operating temperature can be up to as high as 800 , please limit the working temperature < 550 (+/- 5 accuracy) due to precursor deposition issue. Substrate size to be coated: 100 mm in diameter. Chamber Quartz glass tube, 165 mm OD. X 150 mm ID x 250 mm Height Please click here to order the Quartz Chamber replacement. SS 304 flanges to ensure the vacuum level: 10-5 torr by turbopump and 10-2 by the mechanical pump KF 25 vacuum port is built-in Heatable Bubbler Two 150 ml Heatable bubblers with temperature controllers are included for carrying precursors To precisely control the precursor pressure in the bubbler, the gauge of PGC-554-LD is highly recommended. Vacuum Pump ( optional) A vacuum pump is not included, suggest you order a dry pump for the CVD process by click the picture below Compliance CE certified and NRTLor CSA certification is available upon request at an extra cost.

Power
  • 208 - 240VAC, single phase, 50/60 Hz
  • 9.5 kW total (required for all heating parts and plasma to work properly)

Control Panel

 
  • All processing parameters of ALD are controlled by PLC via a 6" touch screen panel, including vapor pulse time, inert gas flow rate, temperature for heating bubbler and belt, and rotation speed of sample stage 
  • 13.56MHZ, 100W max. RF plasma power and auto-matching
  • High-frequency ALD valves were used to control pulse duration interval with micro-second precision
  • Control two channels of gas delivery with ±0.2%F.S via MFC
  • Adjust vacuum pressure by controlling the gas flow rate 
  • Other parameters upon request of the customer
  • Please click the picture left to see the control interface
ALD valve
  • One frequency ALD valve
    • Max. frequency on/off: 283 HZ
    • Min. Pulse time: 10 ms
  • Can deliver drying gas or liquid-vapor
Shower Head
  • Material: Aluminium or Stainless steel
  • 4" shower head with 0.5 mm holes
  • 1/4" dia. tube for gas or vapor inlet which connects to ALD valve
  • Special design for uniform distribution of gas or vaper
  •  
Sample Stage
  • 4" diameter rotary and heatable sample stage
  • Speed: 0 - 5 RPM adjustable via the control panel
  • Temperature: Although the operating temperature can be up to as high as 800 , please limit the working temperature < 550 (+/- 5 accuracy) due to precursor deposition issue.  
  • Substrate size to be coated: 100 mm in diameter.
Chamber
  • Quartz glass tube, 165 mm OD. X 150 mm ID x 250 mm Height
    • Please click here to order the Quartz Chamber replacement.
  • SS 304 flanges to ensure the vacuum level: 10-5 torr by turbopump and 10-2 by the mechanical pump
  • KF 25 vacuum port is built-in
Heatable Bubbler
  • Two 150 ml Heatable bubblers with temperature controllers are included for carrying precursors
  •      
  • To precisely control the precursor pressure in the bubbler, the gauge of PGC-554-LD is highly recommended.
  •               
Vacuum Pump 
( optional)
  • A vacuum pump is not included, suggest you order a dry pump for the CVD process by click the picture below
Compliance
  • CE certified and NRTLor CSA certification is available upon request at an extra cost.