Ge Wafer (110) N-type Undoped, 4" dia x 0.5 mm, 2SP,R>50ohm.cm - GEUe101D05C2R50US

Specification

• Growing Method: CZ
• Orientation: (110) +/-0.5 Deg.
• Wafer Size: 4" dia x  500 microns  
• Surface Polishing: two sides epi polished
• Surface roughness: < 30 A ( by AFM)
• Doping: Undoped
• Conductor type: N-type
• Resistivity: >50  Ohms/cm (If you would like to measure the resistivity accurately, please order our Portable 4 Probe Resistivity Testing Instrument.)
• Package: under 1000 class clean room     

Typical Properties:

• Structure: Cubic, a = 5.6754 A
• Density: 5.323 g/cm3 at room temperature
• Melting Point: 937.4 ^oC
• Thermal Conductivity: 640

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