Description
10x10x0.45 mm InSb wafer (N type, Te doped)
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Size: 5x5x0.3 mm
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Orientation: <100> +/-0.5o with two reference flats
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Polishing: one-side side polished ( back side etched )
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Packing: Sealed under nitrogen with single wafer container in 1000 class clean room
Properties
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Growth method: LEC
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Orientation: (100) +/- 0.5o
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Doping: Te doped
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Conductivity type: N type
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Carrier Concentration: (0.19- 0.5)E18 @77K
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Mobility: >(3.58-5.6)E4 cm2/Vs
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EPD: <1200 - 1500 / cm 2
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Other GaAs |
InSb |
Other InAs |
InP |
GaSb |
Wafer Box |
Film Coaters |
RTP Furnaces |