{"product_id":"vtc-3rf","title":"3 Heads 1\" RF Plasma Magnetron Sputtering Coater, with DC Magnetron Sputtering Option - VTC-3RF","description":"\u003cp\u003eVTC-3RF is a three head 1\" RF Plasma magnetron sputtering system designed for non-metallic thin film coating, mainly for multilayer oxide thin films. It is the most cost-effective coater for researching in the new generation of oxide thin films. DC magnetron sputtering option is available upon request for metallic film deposition, enabling three DC, one RF \/ two DC, and two RF \/ one DC sputtering head configurations.\u003c\/p\u003e\n\u003cp\u003e \u003cstrong\u003eSPECIFICATIONS\u003c\/strong\u003e\u003cbr\u003e\u003c\/p\u003e\n\u003ctable cellspacing=\"0\" cellpadding=\"1\" border=\"1\" style=\"font-size: 0.875rem;\"\u003e\n\u003ctbody\u003e\n\u003ctr\u003e\n\u003ctd\u003eInput Power\u003cbr\u003e\u003ca rel=\"noopener\" href=\"TF-220110-1000-LD\" target=\"_blank\"\u003e\u003cimg width=\"68\" src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0638\/4664\/6008\/files\/NEW.AC3000Title.jpg\" height=\"45\" alt=\"\"\u003e\u003c\/a\u003e\n\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eSingle-phase 220VAC +\/- 10%, 50 \/ 60 Hz\u003c\/li\u003e\n\u003cli\u003e1000 W (including a vacuum pump and water chiller)\u003c\/li\u003e\n\u003cli\u003eIf the voltage is 110 V, a 1500 W transformer can be ordered at MTI (Click the picture to the left for detail)\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003ePower Source\u003cbr\u003e\u003ca rel=\"noopener\" href=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0638\/4664\/6008\/files\/Power_Source.jpg?v=1706240110\" target=\"_blank\"\u003e\u003cimg width=\"120\" src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0638\/4664\/6008\/files\/Power_Source.jpg?v=1706240110\" alt=\"\"\u003e\u003c\/a\u003e\u003cbr\u003e\u003cbr\u003e\u003cbr\u003e\n\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003e13.5 MHz, 100 W RF generator with manual matching is included and connected to the sputtering heads\u003c\/li\u003e\n\u003cli\u003eContinuous working time:\u003c\/li\u003e\n\u003cul\u003e\n\u003cli\u003e100W: ≤ 1 hour\u003c\/li\u003e\n\u003cli\u003e80W: ≤ 1.5 hours\u003c\/li\u003e\n\u003cli\u003e70W: ≤ 2 hours\u003c\/li\u003e\n\u003cli\u003e60W: ≤ 4 hours\u003c\/li\u003e\n\u003cli\u003e50W: ≤ 8 hours\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cli\u003eLoad range: 0 – 80 adjustable. Tuning range: -200j – 200j adjustable\u003c\/li\u003e\n\u003cli\u003eThe rotatable switch can activate one sputtering head at a time. Sputtering heads can be switched “in the plasma” (no breaking of vacuum and plasma during a multilayer process)\u003c\/li\u003e\n\u003cli\u003e\n\u003cstrong\u003eWith a DC power supply, the coater can be easily modified into 1” DC sputtering sources for metallic film deposition, enabling three DC, one RF \/ two DC, and two RF \/ one DC sputtering head configurations\u003c\/strong\u003e (Bottom left picture. Please select from the Product Options)\u003c\/li\u003e\n\u003cli\u003eOptional 300 W auto-match RF generator is available at extra cost (Click the bottom right picture for detail )\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e\u003ca rel=\"noopener\" href=\"DC-500-LD\" target=\"_blank\"\u003e\u003cimg width=\"90\" src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0638\/4664\/6008\/files\/VTC600.jpg\" height=\"60\" alt=\"\"\u003e\u003c\/a\u003e 500 W DC Power Supply  \u003c\/p\u003e\n\u003cp\u003e   \u003ca href=\"https:\/\/mtimalaysia.com\/products\/RF-300I-LD\" target=\"_blank\" rel=\"noopener\"\u003e\u003cimg src=\"https:\/\/mtimalaysia.com\/cdn\/shop\/files\/DSC_6670.1_62f05e2e-79b2-4c2d-a04e-b8f86cc99ede.jpg?v=1764850746\u0026amp;width=3840\" alt=\"Compact RF Generator 13.56 MHz 300W with Auto Matching Network for DIY RF Sputtering - RF-300I-LD\" width=\"89\" height=\"60\"\u003e\u003c\/a\u003e\u003cbr\u003e300 W RF Power Supply   \u003c\/p\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\n\u003cp\u003eMagnetron Sputtering Head\u003cbr\u003e\u003ca rel=\"noopener\" href=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0638\/4664\/6008\/files\/VTC3RF13.jpg\" target=\"_blank\"\u003e\u003cimg width=\"90\" src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0638\/4664\/6008\/files\/VTC3RF13.jpg\" height=\"60\" alt=\"\"\u003e\u003c\/a\u003e\u003c\/p\u003e\n\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eThree 1\" magnetron sputtering heads with water cooling jackets (Click Pic #1 for detail information) are included and inserted into quartz chamber via quick clamps\u003c\/li\u003e\n\u003cli\u003eRF cable replacement can be purchased at MTI (Click Pic #2 for detail information)\u003c\/li\u003e\n\u003cli\u003eOne manually operated shutter is built on the flange (See Pic #3)\u003c\/li\u003e\n\u003cli\u003e10 L\/min recirculating water chiller is included for cooling sputtering heads (Click Pic #4 for detail )\u003c\/li\u003e\n\u003c\/ul\u003e\n \u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\n\u003cp\u003eSputtering Target\u003c\/p\u003e\n\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eTarget size requirement: 1\" diameter x 1\/8\" thickness max\u003c\/li\u003e\n\u003cli\u003eSputtering distance range: 50 – 80 mm adjustable\u003c\/li\u003e\n\u003cli\u003eSputtering angle range: 0 – 25° adjustable \u003c\/li\u003e\n\u003cli\u003e1\" diameter Cu target and Al\u003csub\u003e2\u003c\/sub\u003eO\u003csub\u003e3\u003c\/sub\u003e target are included for demo testing\u003c\/li\u003e\n\u003cli\u003eVarious oxide 1” sputtering targets are available upon request at extra cost\u003c\/li\u003e\n\u003cli\u003eFor target bonding, 1 mm and 2 mm copper backing plates are included. Silver epoxy (Pic #1) and extra copper backing plates (Pic #2) can be ordered at MTI\u003cbr\u003e\n\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eVacuum Chamber\u003cbr\u003e\u003cbr\u003e\n\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eVacuum chamber: 256 mm OD x 238 mm ID x 276 mm Height, made of high purity quartz\u003c\/li\u003e\n\u003cli\u003eSealing flange: 274 mm Dia. made of Aluminum with high-temperature silicone O-ring\u003c\/li\u003e\n\u003cli\u003eStainless steel shield cage is included for 100% shielding of RF radiation from the chamber\u003c\/li\u003e\n\u003cli\u003eMax vacuum level: 1.0E-5 Torr with optional turbopump and chamber baking \u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\n\u003cp\u003eSample Holder\u003cbr\u003e\u003ca rel=\"noopener\" href=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0638\/4664\/6008\/files\/sampleholder.1.png\" target=\"_blank\"\u003e\u003cimg width=\"95\" src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0638\/4664\/6008\/files\/sampleholder.1.png\" height=\"60\" alt=\"\"\u003e\u003c\/a\u003e\u003ca rel=\"noopener\" href=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0638\/4664\/6008\/files\/123.2.jpg\" target=\"_blank\"\u003e\u003cimg width=\"72\" src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0638\/4664\/6008\/files\/123.2.jpg\" height=\"60\" alt=\"\"\u003e\u003c\/a\u003e\u003c\/p\u003e\n\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eThe sample holder is a rotatable and heatable stage made of the ceramic heater with stainless steel cover\u003c\/li\u003e\n\u003cli\u003eSample holder size: 50 mm Dia. for. 2\" wafer max (See picture below)\u003c\/li\u003e\n\u003cli\u003eRotation speed: 1 - 10 rpm adjustable for uniform coating\u003c\/li\u003e\n\u003cli\u003eThe holder temperature is adjustable from RT to 600 °C max (5 min max at 600 °C; 2 hr max at 500 °C) with accuracy +\/- 1.0 °C via a digital temperature controller\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eVacuum Pump \u003cbr\u003e\u003cbr\u003e\n\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eKF40 vacuum port is built-in for connecting to a vacuum pump.\u003c\/li\u003e\n\u003cli\u003eVacuum level: 1.0E-2 Torr with included dual-stage mechanical pump (Click the picture on the left)\u003c\/li\u003e\n\u003cli\u003e1.0E-5 Torr with optional turbopump (Click the picture 1-2)\u003c\/li\u003e\n\u003cli\u003eVacuum level: 1.0E-2 Torr with dual-stage mechanical pump and 1.0E-5 Torr with the turbopump\u003c\/li\u003e\n\u003cli\u003eThe 1 PPm ga purification system may be used to replace turbopump to get a more clean chamber (Pic.3)\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ca rel=\"noopener\" href=\"FYP-Pump\" target=\"_blank\"\u003e\u003cimg width=\"81\" src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0638\/4664\/6008\/files\/EQFYPmain.1.1.jpg\" height=\"54\" alt=\"\"\u003e\u003c\/a\u003e    \u003ca rel=\"noopener\" href=\"PV-HVS-LD\" target=\"_blank\"\u003e\u003cimg width=\"74\" src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0638\/4664\/6008\/files\/PfeifferVacuumPumpEco_TUV.jpg\" height=\"49\" alt=\"\"\u003e\u003c\/a\u003e \u003ca rel=\"noopener\" href=\"RMP-LD\" target=\"_blank\"\u003e\u003cimg width=\"72\" title=\"\" src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0638\/4664\/6008\/files\/IMG_2617-02.2.jpg\" height=\"48\" border=\"0\" alt=\"\"\u003e\u003c\/a\u003e Pic. 3\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003eOptional\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003ePrecision quartz thickness sensor is optional. It can be built into the chamber to monitor coating thickness with an accuracy of 0.1 Å (water cooling required) \u003c\/li\u003e\n\u003cul\u003e\n\u003cli\u003eEasy USB connection to PC for remote thickness and coating speed monitoring\u003c\/li\u003e\n\u003cli\u003e5 pcs quartz sensors (consumable) are included \u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cli\u003eRemote PC control of the temperature controller is optional \u003c\/li\u003e\n\u003cul\u003e\n\u003cli\u003eEasy USB connection to PC for remote temperature control\u003c\/li\u003e\n\u003cli\u003eTemperature control software is included. The module is compatible with LabView\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cli\u003eFor DC magnetron sputtering, turbopump is recommended \u003c\/li\u003e\n\u003cli\u003eReactive sputtering with N\u003csub\u003e2\u003c\/sub\u003e or O\u003csub\u003e2\u003c\/sub\u003e is available with optional gas mixing control station\u003c\/li\u003e\n\u003cli\u003eThe coater can be modified into a powder coating \u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ca rel=\"noopener\" href=\"TM106-LD\" target=\"_blank\"\u003e\u003cimg width=\"90\" src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0638\/4664\/6008\/files\/EQTM106.5.jpg\" height=\"60\" alt=\"\"\u003e\u003c\/a\u003e\u003ca href=\"..\/..\/..\/Film-thickness-controller.aspx\"\u003e \u003c\/a\u003ePic. 1 \u003cspan style=\"font-size: 0.875rem;\"\u003e \u003ca rel=\"noopener\" href=\"VTC-3HD-VP\" target=\"_blank\"\u003e\u003cimg width=\"94\" title=\"\" src=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0638\/4664\/6008\/files\/VTC-3-RF-GP.jpg\" height=\"62\" border=\"0\" alt=\"\"\u003e\u003c\/a\u003ePic. 2\u003c\/span\u003e\u003cbr\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\n\u003cp\u003eCompliance\u003cbr\u003e\u003cbr\u003e\u003c\/p\u003e\n\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eCE approval\u003c\/li\u003e\n\u003cli\u003eNRTL or CSA is NOT available temporarily.\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd\u003e\n\u003cp\u003eApplication Notes\u003c\/p\u003e\n\u003c\/td\u003e\n\u003ctd\u003e\n\u003cul\u003e\n\u003cli\u003eThis compact 1\" RF magnetron sputtering coater is designed for coating oxide thin films on oxide single crystal substrates, which usually does not need high vacuum set-up\u003c\/li\u003e\n\u003cli\u003eA two-stage pressure regulator (not included) should be installed on the gas cylinder to limit the output pressure of the gas to below 0.02 MPa for safe usage. Please use \u0026gt; 5N purity Ar gas for plasma sputtering\u003c\/li\u003e\n\u003cli\u003eFor the best film-substrate adhesion strength, please clean the substrate surface before coating:\u003c\/li\u003e\n\u003cul\u003e\n\u003cli\u003eUltrasonic cleaning with the following sequential baths - (1) acetone, (2) isopropyl alcohol - to remove oil and grease. Blow-dry the substrate with N2, then hot bake in vacuum to remove absorbed moisture\u003c\/li\u003e\n\u003cli\u003ePlasma cleaning may be needed for surface roughening, surface chemical bonds activation, or additional contamination removal\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/ul\u003e\n\u003cul\u003e\n\u003cli\u003eFor best performance, the non-conductive targets must be installed with a copper backing plate. Please refer to the instruction video below (#3) for target bonding\u003c\/li\u003e\n\u003cli\u003eMTI supplies single crystal substrate from A to Z \u003c\/li\u003e\n\u003cli\u003eMTI RF Plasma Sputtering Coaters have successfully coated ZnO on Al\u003csub\u003e2\u003c\/sub\u003eO\u003csub\u003e3\u003c\/sub\u003e substrate at 500 °C \u003c\/li\u003e\n\u003cli style=\"color: rgb(255, 42, 0);\"\u003e\n\u003cspan\u003eHIGH VOLTAGE! Sputtering heads connect to high voltage. For safety, the operator must shut down the RF generator before sample loading and target changing operations\u003c\/span\u003e\u003cbr\u003e\n\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e","brand":"MTI","offers":[{"title":"RF \/ DC Sputtering","offer_id":44985185042571,"sku":"VTC1RFDC","price":0.0,"currency_code":"MYR","in_stock":false},{"title":"RF Sputtering ONLY","offer_id":44985185075339,"sku":"VTC1RF3","price":0.0,"currency_code":"MYR","in_stock":false},{"title":"DC Sputtering ONLY","offer_id":44985185108107,"sku":"VTC1DC3","price":0.0,"currency_code":"MYR","in_stock":false}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0716\/4405\/3643\/files\/VTC3RF11.1.1_10acfac0-cbdb-48ef-ab51-799c9f6b5747.jpg?v=1764855086","url":"https:\/\/mti-indonesia.com\/products\/vtc-3rf","provider":"MTI Malaysia \u0026 Indonesia","version":"1.0","type":"link"}