Skip to product information
1000 nm Silicon Nitride Film (LPCVD) on Si(100), P-type, B-doped 100 mm dia .x0.525mm thick, 1sp,R:1-20 ohm.cm
  • 1000 nm Silicon Nitride Film (LPCVD) on Si(100), P-type, B-doped 100 mm dia .x0.525mm thick, 1sp,R:1-20 ohm.cm
1000 nm Silicon Nitride Film (LPCVD) on Si(100), P-type, B-doped 100 mm dia .x0.525mm thick, 1sp,R:1-20 ohm.cm

1000 nm Silicon Nitride Film (LPCVD) on Si(100), P-type, B-doped 100 mm dia .x0.525mm thick, 1sp,R:1-20 ohm.cm

SKU: 1000-nm-silicon-nitride-film-lpcvd-on-si100-p-type-b-doped-100-mm-dia-x0-525mm-thick-1sp-r-1-20-ohm-cm

Price: RFQ

Description

 Silicon Nitride Film Si3N4 Film coated by low stress LPCVD method Si3N4 Thickness:1000 nm +/- 10% Si3N4 covers both sides of Silicon wafer Refractive Index of Si3N4: 1.95 - 2.05 Silicon Wafer

Thin Films  A-Z

Crystal wafer A-Z

Plasma Cleaner

Wafer Containers

Dicing saw

Film Coater