Four Nozzles Spin-Spray Coater (300-3000 rpm, 12" Wafer) w/ Optional Spraying Heads - VTC-300SS-4

• Combine the benefits of both spin and spray, enabling dense and uniform liquid-phase coating onto a large substrate
• Four spray head to make multi-layer coating as program setting through touch screen control panel. 
• Applications include low-temperature precipitation (e.g., for RF/microwave ferrites deposition), polymer coating, powder and composite material coating, and coating on a patterned / uneven substrate

• Vacuum chuck with adjustable substrate holders for holding flat substrate up to 12" diameter or 8" square
• One oil-less pump for the vacuum chuck is included and controlled by the spin coater
• Spin speed: 300 - 3000 rpm adjustable
• For safety concerns, the speed is recommended to be limited to 2000 rpm for wafers larger than 8"
  

           

          Pic. 1     Pic. 2   Pic. 3

• Note Higher frequency will result in a smaller atomizing and thinner coating, but higher cost

Peristaltic Pumps

• Fours peristaltic pumps are included for delivering four types of the solution as programma.
• Flow rate:  0.05 - 380 ml/min programmable.
• The four types of solution can be injected during spinning one by one with setting flow rate and duration time
• The solenoid valves are connected to each pump to allow only one solution injection to avoid cross-contamination.

• The heatable top cover is available upon request at extra cost
• Heating element:  Ring type of halogen lamp
• The precision digital controller is  included with +/- 1ºC accuracy
• Max. working temperature:  100ºC

• The touch screen control panel can set programm for
• Spin speed: 100 - 3000 rpm (not programmable)
• Injection of solution sequence from  1 to 4  pump
• Time of injection for each pump
• Number of cycles

• Power: 208 - 240 VAC, 50/60 Hz, 3000 W in total

• 160 lbs

• #1: 423 lbs, 48x40x42"
  #2: 155 lbs, 48x40x35"

• CE Certified
• NRTL certification is NOT available temporary.

• One year limited with lifetime support
  
• Rusting and damage due to improper storage condition or maintenance are not covered by warranty

• It is the user’s responsibility to understand the risks associated with the process and use proper protection. The process must be confined in a fume hood (Pic. 1) with proper exhaust handling capability. 
• The film coating quality depends on the solution viscosity, substrate spin speed, substrate heating, and ultrasonic spray parameters, etc. The user is advised to experiment with the processing parameters for best results

• Do not overflush the water bowl/base with any kind of liquid. Excess liquid will leak into the motor shaft and cause damage. Please use fabric cloth to wipe out the liquid residues in the bow/base. For more details about the cleaning procedures, please review the cleaning instruction for the spin coaters

• In order to achieve optimal coating quality, please consider cleaning the substrate with a plasma cleaner (Click the pictures 2 & 3  below for more details) prior to coating. It will significantly reduce the surface tension on the substrates

 Pic. 1      Pic. 2      Pic. 3

• Strong Magnetoelectric Coupling in Ferrite/Ferroelectric Multiferroic Heterostructures Derived by Low-Temperature Spin-Spray Deposition
• Spin- and Spray-Deposited Single-Walled-Carbon-Nanotube Electrodes for Organic Solar Cells
• Rapid Assembly of Functional Nanocomposite Films Using Spin-Spray Layer-by-Layer Processing