Nickel <111> Film (100nm) + 300 nm SiO2 coated Silicon Wafer -4" dia .(100) P/Boron ,SSP, R:1-20 ohm.cm

Nickel <111> Film (100nm) + 300 nm SiO2 coated Silicon Wafer -4" dia .(100) P/Boron ,SSP, R:1-20 ohm.cm

RM0.00 MYR
RM0.00 MYR
Skip to product information
Nickel <111> Film (100nm) + 300 nm SiO2 coated Silicon Wafer -4" dia .(100) P/Boron ,SSP, R:1-20 ohm.cm
  • Nickel <111> Film (100nm) + 300 nm SiO2 coated Silicon Wafer -4" dia .(100) P/Boron ,SSP, R:1-20 ohm.cm
Nickel <111> Film (100nm) + 300 nm SiO2 coated Silicon Wafer -4" dia .(100) P/Boron ,SSP, R:1-20 ohm.cm

Nickel <111> Film (100nm) + 300 nm SiO2 coated Silicon Wafer -4" dia .(100) P/Boron ,SSP, R:1-20 ohm.cm

SKU: nickel-111-film-100nm-300-nm-sio2-coated-silicon-wafer-4-dia-100-p-boron-ssp-r-1-20-ohm-cm

Price: RFQ

Description

 Nickel Metallic Film Nickel Thickness: 100nm Film Crystallinity: (111) - oriented polycrystals Roughness, RMS:  N/A Silicon Wafer

Thin Films  A-Z

Crystal wafer A-Z

Plasma Cleaner

 Wafer Containers

Dicing saw

Film Coater