PVD / CVD Hybrid Coater for Multi-layer Film Coating - VTC-150-H

PVD / CVD Hybrid Coater for Multi-layer Film Coating - VTC-150-H

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RM0.00 MYR
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PVD / CVD Hybrid Coater for Multi-layer Film Coating - VTC-150-H
  • PVD / CVD Hybrid Coater for Multi-layer Film Coating - VTC-150-H
  • PVD / CVD Hybrid Coater for Multi-layer Film Coating - VTC-150-H
PVD / CVD Hybrid Coater for Multi-layer Film Coating - VTC-150-H

PVD / CVD Hybrid Coater for Multi-layer Film Coating - VTC-150-H

SKU: pvd-cvd-hybrid-coater-for-multi-layer-film-coating-vtc-150-h

Price: RFQ

Description

 VTC-16--PW is a compact powder PVD coater, which consists of 2" water cold magnetron sputtering head and vibration stage. The particles will jump on the vibration stage during the coating and form a core-shell structure. The DC magnetron sputter is suitable for coating for metallic materials. RF power source is optional for non-conductive material or carbon. The coater will be useful for preparing special powder for 3D printing and solid-state electrolyte powders. SPECIFICATIONS Power 208 - 240VAC, 50/60Hz, single phase 3000 W Furnace The Whole PCV/CVD system is integrated into the compact 1100°C Single Zone 5" Verticle Tube Furnace (click Pic. left for detail specs) Sputtering Head Click Picture left for detail specs 1" flexible magnetron sputtering head with water cooling jacket is included The distance between the sputtering head and the sample stage is adjustable from 60 - 100 mm One Water Cold Recirculating Water Chiller 16 L/min Flow is included for cooling sputtering head . . . . Rotary Sample Stage One 3" Dia. the rotary sample holder is in installed on the bottom flange of the vertical tube furnace Rotation speed is adjustable: 1 - 10 rpm for uniform coating Control Panel 6" color touch-screen control panel with PLC integration for easy operation One panel for all parameters monitor and control: vacuum, current Ultimate Vacuum Pressure Built-in KF25 vacuum port The system requires an Ar gas tank with a pressure regulator (not included) < 1.0E-2 Torr by Vane vacuum pump (not included) for Au, Ag, Pt, Cu, Mo targets (not sensitive to air) < 1.0E-5 Torr by Turbomolecular pump (not included) for Al, Mg, Li, Lr, Ti, Zn targets (sensitive to air) The lowest vacuum may reach < 4.0E-6 Torr by pumping overnight and baking Gas Atmosphere One needle valve installed to allow Ar gas inlet to achieve better plasma coating The system requires an Ar gas tank with the pressure regulator (not included) Target One 1" Copper target is included for testing, target size: 1" Dia. x 2.5mm It also can coat Ag, Al, Cr, Ni, Pt, Ti, Sn, Li, Mg , etc. almost every kind of metallic material Warning: Aluminum, Chromium or Nickel can be coated by this machine, but please view the Recommend Coating Method in the below target link Please using RF Plasma Magnetron Sputtering coater for coating non-conductive materials and carbon Net Weight 50 kg Compliance CE approval NRTL (UL 6100) certification is available upon request at an extra cost, please contact our sales representative for a quote

 Power
  • 208 - 240VAC, 50/60Hz, single phase
  • 3000 W
Furnace
  • The Whole PCV/CVD system is integrated into the compact 1100°C Single Zone 5" Verticle Tube Furnace (click Pic. left for detail specs)

Sputtering Head 
  • Click Picture left for detail specs
  • 1" flexible magnetron sputtering head with water cooling jacket is included 
  • The distance between the sputtering head and the sample stage is adjustable from 60 - 100 mm
  • One Water Cold Recirculating Water Chiller 16 L/min Flow is included for cooling sputtering head 
. . . .

Rotary Sample Stage
  • One 3" Dia. the rotary sample holder is in installed on the bottom flange of the vertical tube furnace
  • Rotation speed is adjustable: 1 - 10 rpm for uniform coating
Control Panel
  • 6" color touch-screen control panel with PLC integration for easy operation
  • One panel for all parameters monitor and control: vacuum, current
Ultimate Vacuum Pressure
  • Built-in KF25 vacuum port
  • The system requires an Ar gas tank with a pressure regulator (not included)
  • < 1.0E-2 Torr by Vane vacuum pump (not included) for Au, Ag, Pt, Cu, Mo targets (not sensitive to air)
  • < 1.0E-5 Torr by Turbomolecular pump (not included) for Al, Mg, Li, Lr, Ti, Zn targets (sensitive to air)
  • The lowest vacuum may reach < 4.0E-6 Torr by pumping overnight and baking
Gas Atmosphere
  • One needle valve installed to allow Ar gas inlet to achieve better plasma coating
  • The system requires an Ar gas tank with the pressure regulator (not included)

Target
  • One 1" Copper target is included for testing, target size: 1" Dia. x 2.5mm
  • It also can coat Ag, Al, Cr, Ni, Pt, Ti, Sn, Li, Mg, etc. almost every kind of metallic material
  • Warning: Aluminum, Chromium or Nickel can be coated by this machine, but please view the Recommend Coating Method in the below target link
  • Please using RF Plasma Magnetron Sputtering coater for coating non-conductive materials and carbon
Net Weight
  • 50 kg
Compliance
  • CE approval
  • NRTL (UL 6100) certification is available upon request at an extra cost, please contact our sales representative for a quote