SiO2+Ti+Pt(111) thin film on Si substrate ,4"x0.525mm,1sp P-type B-doped,( SiO2=300nm,Ti=10nm ,Pt(111)=150nm)

SiO2+Ti+Pt(111) thin film on Si substrate ,4"x0.525mm,1sp P-type B-doped,( SiO2=300nm,Ti=10nm ,Pt(111)=150nm)

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SiO2+Ti+Pt(111) thin film on Si substrate ,4"x0.525mm,1sp P-type B-doped,( SiO2=300nm,Ti=10nm ,Pt(111)=150nm)

SiO2+Ti+Pt(111) thin film on Si substrate ,4"x0.525mm,1sp P-type B-doped,( SiO2=300nm,Ti=10nm ,Pt(111)=150nm)

SKU: sio2-ti-pt111-thin-film-on-si-substrate-4x0-525mm-1sp-p-type-b-doped-sio2-300nm-ti-10nm-pt111-150nm

Price: RFQ

Description

Silicon Wafer Specifications:

  • Film:         SiO2+Ti+Pt(111) thin film on Si (100) (P-type) substrate ,4"x0.525mm,1sp
      • SiO2=300nm
      • Ti=10nm
      • Pt(111)=150nm
  • Resistivity:                  1-20 ohm.cm   (If you would like to measure the resistivity accurately, 
                                      please order our Portable 4 Probe Resistivity Testing Instrument.
  • Substrate Size:            4" diameter +/- 0.5 mm x 0.525 mm
  • Polish:                        one side polished
  • Surface roughness:      < 20 A RMS
  • Maximum Thermal Budget of Pt/Ti film-coated SiO2/Si wafers: < 650-700 C/ 1 hr in air