Description
Step STO substrate is an atomically smooth SrTiO3 (100) with steps one unit cell in height was obtained by treating the crystal surface with a pH-controlled NH4F-HF solution. The homoepitaxy of SrTiO3 film on the crystal surface proceeds in a perfect layer-by-layer mode as verified by reflection high-energy electron diffraction and atomic force microscopy. Ion scattering spectroscopy revealed that the TiO2 atomic plane terminated the as-treated clean surface and that the terminating atomic layer could be tuned to the SrO atomic plane by homooepitaxial growth. This technology provides a well-defined substrate surface for atomically regulated epitaxial growth of such perovskite oxide films .
For more information on Step substrate, please refer to the article at
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Surface of SrTiO3 substrate after Step treatment (AFM)
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Surface of SrTiO3 substrate before Step treatment (AFM)
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 Typical AFM picture of step STO substrate
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Substrate Specifications
- Size: 10x10x 0.5mm +/-0.05mm
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Orientation: 0.1º miscut from (100) ( +/- 0.1º from Y and X direction )
- Polish: One-side EPI polished by CMP technology with less sub-surface lattice damage
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Surface Termination: TiO2 layer ( via special etching)
- Surface finish (RMS or Ra): <5A
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Typical Physical Properties |
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Crystal Structure |
Cubic, a=3.905Å |
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Growth Method |
Vernuil |
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Density |
5.175 g/cm3 |
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Melt Point |
2080 oC |
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Hardness |
6 ( Mohn) |
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Thermal expansion |
10.4 (x10-6/ oC) |
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Dielectric Constant |
~ 300 |
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Loss Tangent at 10 GHz |
~5x10-4 @ 300K , ~3 x10-4 @77K |
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Color and Appearance |
Transparent (sometimes slightly brown based on annealing condition). No twins. |
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Chemical Stability |
Insoluble in water |
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