VTC-600-3HD-LD is a combinatorial plasma sputtering system with three 2“ magnetron sputtering sources and three RF/DC power supplies. Such a sputtering system is capable of co-sputtering up to three different target materials and creates various composition profiles across the substrate (e.g. ternary materials for Li-ion rechargeable battery). This system is also suitable for sequential coating of multiple layer films such as ferroelectric, alloy, semiconductor, ceramic, dielectric, optical, oxide, hard, PTFE, etc.
SPECIFICATIONS
| Power |
- 208-240 VAC, single phase, 50/60 Hz, 1500 W
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Source Power
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- Three sputtering power sources
- Two DC source: 500 W power for coating metallic materials
- One RF source: 300 W power, 13.56 MHz frequency for coating non-conductive materials
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Magnetron Sputtering Head
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Vacuum Chamber
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- Stainless steel vacuum chamber: Ø300 × 300 mm H
- One 100 mm glass view port.
- Hinged type top flange for easy sample access
- Here is a glance of the vacuum chamber
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Sample Stage
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- Ø140 mm rotating and heating sample stage up to 500°C
- Rotation speed: 1 - 20 rpm
- Single-point programmable temperature controller
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Gas Flow Control
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Vacuum Pump Station
(Optional)
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- For air-sensitive targets, such as Al, Ti, Cr, etc, or base pressure <1e-2 torr, a pumping station (turbo + backing pumps) is recommended
- Turbo pump .
- Backing pump
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Water Chiller
(Optional)
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- Chilled water is required
- One digital temperature-controlled recirculating water chiller is recommended
- Refrigeration range: 5~35 °C
- Flow rate: 16 L/min
- Pump pressure: 14 psi
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Film Thickness Measurement
(Optional)
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Compliance
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- CE approval
- NRTL certification is available upon request at extra cost, please contact our sales representative for the quote.
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Application Note
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- This coater may be placed into a standard glovebox with modification for thin-film battery research
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